Layout design support apparatus, layout design support method, and manufacturing method of semiconductor device

1. A layout design support apparatus for an integrated circuit in which a plurality of circuit elements having different breakdown voltages coexist, the layout design support apparatus comprising:

a storage device storing circuit connection data of the integrated circuit combining circuit components which comprise a first external terminal, a second external terminal, and the circuit elements to which element type information and breakdown voltage information are to be added;

an input device receiving first potential information to be added to the first external terminal; and

a control device which

determines, in the circuit element connected to the first external terminal to which the first potential information is added, whether to short-circuit one terminal connected to the first external terminal and another terminal based on a determination criterion according to the element type information and the breakdown voltage information,

adds the first potential information to the circuit components on a path from the first external terminal to the one terminal of the circuit element to identify a first equipotential region according to determining not to short-circuit the one terminal and the another terminal of the circuit element, and

repeatedly performs determination for the circuit element connected to the another terminal and identifies the first equipotential region according to determining to short-circuit the one terminal and the another terminal of the circuit element,

wherein the control device identifies a second equipotential region when the input device receives second potential information to be added to the second external terminal.

2. The layout design support apparatus according to claim 1 , wherein the first equipotential region and the second equipotential region are identified as low breakdown voltage regions, and

a region identified as both the first equipotential region and the second equipotential region is identified as a high breakdown voltage region.

3. The layout design support apparatus according to claim 2 , wherein the control device adds error information to the circuit element as a target when the circuit element having the breakdown voltage information indicating a high breakdown voltage exists in the low breakdown voltage region or when the circuit element having the breakdown voltage information indicating a low breakdown voltage exists in the high breakdown voltage region.

4. The layout design support apparatus according to claim 2 , wherein the determination criterion comprises determining not to short-circuit between a gate and a drain and between the drain and a source and to short-circuit the gate and the source when the circuit element included in the high breakdown voltage region or the circuit element at a position in contact with the high breakdown voltage region is an NMOS transistor.

5. The layout design support apparatus according to claim 3 , wherein the determination criterion comprises determining not to short-circuit between a gate and a drain and between the drain and a source and to short-circuit the gate and the source when the circuit element included in the high breakdown voltage region or the circuit element at a position in contact with the high breakdown voltage region is an NMOS transistor.

6. The layout design support apparatus according to claim 1 , wherein the control device creates and includes a dummy layer generated according to the breakdown voltage information added to the circuit component in layout data in the case of creating the layout data from the circuit connection data.

7. The layout design support apparatus according to claim 2 , wherein the control device creates and includes a dummy layer generated according to the breakdown voltage information added to the circuit component in layout data in the case of creating the layout data from the circuit connection data.

8. The layout design support apparatus according to claim 3 , wherein the control device creates and includes a dummy layer generated according to the breakdown voltage information added to the circuit component in layout data in the case of creating the layout data from the circuit connection data.

9. The layout design support apparatus according to claim 4 , wherein the control device creates and includes a dummy layer generated according to the breakdown voltage information added to the circuit component in layout data in the case of creating the layout data from the circuit connection data.

10. A layout design support method for an integrated circuit in which a plurality of circuit elements having different breakdown voltages coexist, the layout design support method comprising:

storing circuit connection data of the integrated circuit combining circuit components which comprise a first external terminal, a second external terminal, and the circuit elements to which element type information and breakdown voltage information are to be added;

receiving first potential information to be added to the first external terminal;

determining, in the circuit element connected to the first external terminal to which the first potential information is added, whether to short-circuit one terminal connected to the first external terminal and another terminal based on a determination criterion according to the element type information and the breakdown voltage information;

adding the first potential information to the circuit components on a path from the first external terminal to the one terminal of the circuit element to identify a first equipotential region according to determining not to short-circuit the one terminal and the another terminal of the circuit element; and

repeatedly performing determination for the circuit element connected to the another terminal and identifying the first equipotential region according to determining to short-circuit the one terminal and the another terminal of the circuit element, and

comprising: identifying a second equipotential region according to receiving second potential information to be added to the second external terminal.

11. A manufacturing method of a semiconductor device, comprising a process of designing using the layout design support apparatus according to claim 1 .