IP Library Granted Patent US 4,239,790
Granted Patent Utility
US 4,239,790 · App. 06/075,162

Method of defining a photoresist layer

Inventor: Wolfram A. Bosenberg
Patented Case View Patent ↗
Granted: Dec 16, 1980 Filed: Sep 12, 1979
Inventor
Wolfram A. Bosenberg
Assignee (at issue)
RCA Corporation

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Quick Facts
Patent No.
US 4,239,790
App. No.
06/075,162
Filed
1979-09-12
Granted
1980-12-16
Kind
A