Granted Patent
Utility
US 4,330,671 · App. 06/206,716
Positive resist for electron beam and x-ray lithography and method of using same
Inventor:
Thomas R. Pampalone
Patented Case
View Patent ↗
Granted: May 18, 1982
Filed: Nov 14, 1980
Inventor
Thomas R. Pampalone
Assignee (at issue)
RCA Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.