Granted Patent
Utility
US 4,341,850 · App. 06/230,186
Mask structure for forming semiconductor devices, comprising electron-sensitive resist patterns with controlled line profiles
Inventor:
Philip J. Coane
Patented Case
View Patent ↗
Granted: Jul 27, 1982
Filed: Feb 2, 1981
Inventor
Philip J. Coane
Assignee (at issue)
Hughes Aircraft Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.