Granted Patent
Utility
US 4,359,490 · App. 06/282,768
Method for LPCVD co-deposition of metal and silicon to form metal silicide
Inventor:
William I. Lehrer
Patented Case
View Patent ↗
Granted: Nov 16, 1982
Filed: Jul 13, 1981
Inventor
William I. Lehrer
Assignee (at issue)
Fairchild Camera & Instrument Corp.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.