Granted Patent
Utility
US 4,389,482 · App. 06/330,103
Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
Inventors:
Joachim Bargon, Hiroyuki Hiraoka, Lawrence W. Welsh, Jr.
Patented Case
View Patent ↗
Granted: Jun 21, 1983
Filed: Dec 14, 1981
Inventors
Joachim Bargon
Hiroyuki Hiraoka
Lawrence W. Welsh, Jr.
Assignee (at issue)
International Business Machines Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.