IP Library Granted Patent US 4,389,970
Granted Patent Utility
US 4,389,970 · App. 06/244,389

Apparatus for regulating substrate temperature in a continuous plasma deposition process

Inventor: Robert F. Edgerton
Patented Case View Patent ↗
Granted: Jun 28, 1983 Filed: Mar 16, 1981
Inventor
Robert F. Edgerton
Assignee (at issue)
Energy Conversion Devices, Inc.

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Quick Facts
Patent No.
US 4,389,970
App. No.
06/244,389
Filed
1981-03-16
Granted
1983-06-28
Kind
A