IP Library Granted Patent US 4,396,702
Granted Patent Utility
US 4,396,702 · App. 06/320,015

Method of forming pattern in positive resist media

Inventors: Nitin V. Desai, Eugene S. Poliniak
Patented Case View Patent ↗
Granted: Aug 2, 1983 Filed: Nov 10, 1981
Inventors
Nitin V. Desai
Eugene S. Poliniak
Assignee (at issue)
RCA Corporation

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Quick Facts
Patent No.
US 4,396,702
App. No.
06/320,015
Filed
1981-11-10
Granted
1983-08-02
Kind
A