IP Library Granted Patent US 4,397,938
Granted Patent Utility
US 4,397,938 · App. 06/330,492

Method of forming resist patterns using X-rays or electron beam

Inventors: Nitin V. Desai, Emil J. Gavalchin
Patented Case View Patent ↗
Granted: Aug 9, 1983 Filed: Dec 14, 1981
Inventors
Nitin V. Desai
Emil J. Gavalchin
Assignee (at issue)
RCA Corporation

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Quick Facts
Patent No.
US 4,397,938
App. No.
06/330,492
Filed
1981-12-14
Granted
1983-08-09
Kind
A