Granted Patent
Utility
US 4,419,201 · App. 06/295,531
Apparatus and method for plasma-assisted etching of wafers
Inventors:
Hyman J. Levinstein, Frederick Vratny
Patented Case
View Patent ↗
Granted: Dec 6, 1983
Filed: Aug 24, 1981
Inventors
Hyman J. Levinstein
Frederick Vratny
Assignee (at issue)
Bell Telephone Laboratories, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.