Granted Patent
Utility
US 4,421,786 · App. 06/383,881
Chemical vapor deposition reactor for silicon epitaxial processes
Inventors:
Roop L. Mahajan, Joseph R. Ristorcelli, Jr.
Patented Case
View Patent ↗
Granted: Dec 20, 1983
Filed: Jun 1, 1982
Inventors
Roop L. Mahajan
Joseph R. Ristorcelli, Jr.
Assignee (at issue)
Western Electric Company, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.