IP Library Granted Patent US 4,460,416
Granted Patent Utility
US 4,460,416 · App. 06/450,115

Method for fabricating in-situ doped polysilicon employing overdamped gradually increasing gas flow rates with constant flow rate ratio

Inventor: Casimir J. Wonsowicz
Patented Case View Patent ↗
Granted: Jul 17, 1984 Filed: Dec 15, 1982
Inventor
Casimir J. Wonsowicz
Assignee (at issue)
Burroughs, Inc.

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 4,460,416
App. No.
06/450,115
Filed
1982-12-15
Granted
1984-07-17
Kind
A