Granted Patent
Utility
US 4,467,211 · App. 06/496,902
Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system
Inventors:
Donald O. Smith, Kenneth J. Harte
Patented Case
View Patent ↗
Granted: Aug 21, 1984
Filed: May 23, 1983
Inventors
Donald O. Smith
Kenneth J. Harte
Assignee (at issue)
Control Data Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.