Granted Patent
Utility
US 4,479,455 · App. 06/475,289
Process gas introduction and channeling system to produce a profiled semiconductor layer
Inventors:
Joachim Doehler, Kevin Hoffman, Timothy D. Laarman, Gary M. DiDio, Therese McDonough
Patented Case
View Patent ↗
Granted: Oct 30, 1984
Filed: Mar 14, 1983
Inventors
Joachim Doehler
Kevin Hoffman
Timothy D. Laarman
Gary M. DiDio
Therese McDonough
Assignee (at issue)
Energy Conversion Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.