Granted Patent
Utility
US 4,492,620 · App. 06/530,671
Plasma deposition method and apparatus
Inventors:
Seitaro Matsuo, Toshiro Ono
Patented Case
View Patent ↗
Granted: Jan 8, 1985
Filed: Sep 9, 1983
Inventors
Seitaro Matsuo
Toshiro Ono
Assignee (at issue)
Nippon Telegraph and Telephone Public Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.