IP Library › Granted Patent US 4,504,521
Granted Patent Utility
US 4,504,521 · App. 06/592,397

LPCVD Deposition of tantalum silicide

Inventors: Alois E. Widmer, Roland Fehlmann
Patented Case View Patent ↗
Granted: Mar 12, 1985 Filed: Mar 22, 1984
Inventors
Alois E. Widmer
Roland Fehlmann
Assignee (at issue)
RCA Corporation

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Quick Facts
Patent No.
US 4,504,521
App. No.
06/592,397
Filed
1984-03-22
Granted
1985-03-12
Kind
A