Granted Patent
Utility
US 4,540,650 · App. 06/531,781
Photoresists suitable for forming relief structures of highly heat-resistant polymers
Inventors:
Rudolf Klug, Hartmut Hartner, Hans-Joachim Merrem, Karl-Heinz Neisius
Patented Case
View Patent ↗
Granted: Sep 10, 1985
Filed: Sep 13, 1983
Inventors
Rudolf Klug
Hartmut Hartner
Hans-Joachim Merrem
Karl-Heinz Neisius
Assignee (at issue)
Merck Patent GmbH
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.