Granted Patent
Utility
US 4,569,124 · App. 06/613,114
Method for forming thin conducting lines by ion implantation and preferential etching
Inventors:
David B. Rensch, John Chen
Patented Case
View Patent ↗
Granted: Feb 11, 1986
Filed: May 22, 1984
Inventors
David B. Rensch
John Chen
Assignee (at issue)
Hughes Aircraft Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.