Granted Patent
Utility
US 4,576,884 · App. 06/620,510
Method and apparatus for exposing photoresist by using an electron beam and controlling its voltage and charge
Inventor:
Arnold Reisman
Patented Case
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Granted: Mar 18, 1986
Filed: Jun 14, 1984
Inventor
Arnold Reisman
Assignee (at issue)
Microelectronics Center of North Carolina
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.