Granted Patent
Utility
US 4,587,196 · App. 06/666,743
Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
Inventor:
Medhat A. Toukhy
Patented Case
View Patent ↗
Granted: May 6, 1986
Filed: Oct 31, 1984
Inventor
Medhat A. Toukhy
Assignee (at issue)
Philip A. Hunt Chemical Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.