Granted Patent
Utility
US 4,587,203 · App. 06/737,364
Wet process for developing styrene polymer resists for submicron lithography
Inventors:
Robert G. Brault, Leroy J. Miller
Patented Case
View Patent ↗
Granted: May 6, 1986
Filed: May 23, 1985
Inventors
Robert G. Brault
Leroy J. Miller
Assignee (at issue)
Hughes Aircraft Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.