IP Library Granted Patent US 4,597,989
Granted Patent Utility
US 4,597,989 · App. 06/635,833

Method of depositing silicon films with reduced structural defects

Inventors: Casimir J. Wonsowicz, Glenn Canfield
Patented Case View Patent ↗
Granted: Jul 1, 1986 Filed: Jul 30, 1984
Inventors
Casimir J. Wonsowicz
Glenn Canfield
Assignee (at issue)
Burroughs, Inc.

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Quick Facts
Patent No.
US 4,597,989
App. No.
06/635,833
Filed
1984-07-30
Granted
1986-07-01
Kind
A