Granted Patent
Utility
US 4,615,905 · App. 06/725,616
Method of depositing semiconductor films by free radical generation
Inventors:
Stanford R. Ovshinsky, David D. Allred, Lee Walter, Stephen J. Hudgens
Patented Case
View Patent ↗
Granted: Oct 7, 1986
Filed: Apr 22, 1985
Inventors
Stanford R. Ovshinsky
David D. Allred
Lee Walter
Stephen J. Hudgens
Assignee (at issue)
Sovonics Solar Systems
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.