Granted Patent
Utility
US 4,619,840 · App. 06/497,321
Process and apparatus for low pressure chemical vapor deposition of refractory metal
Inventors:
Jon C. Goldman, Michael A. Fisk, Michael Diem
Patented Case
View Patent ↗
Granted: Oct 28, 1986
Filed: May 23, 1983
Inventors
Jon C. Goldman
Michael A. Fisk
Michael Diem
Assignee (at issue)
Thermco Systems, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.