Granted Patent
Utility
US 4,636,280 · App. 06/643,034
Method for the pretreatment of a substrate for ion implantation
Inventors:
Ryusuke Nakai, Toshihiko Takebe, Hajime Yamazaki
Patented Case
View Patent ↗
Granted: Jan 13, 1987
Filed: Aug 21, 1984
Inventors
Ryusuke Nakai
Toshihiko Takebe
Hajime Yamazaki
Assignees (at issue)
Sumitomo Electric Ind., Ltd.
Nippon Telegraph and Telephone Public Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.