Granted Patent
Utility
US 4,649,101 · App. 06/759,572
Process for the production of photoresist relief structures having an overhang character using o-quinone diazide photoresist with overexposure
Inventors:
Klaus P. Thiel, Raimund Sindlinger, Hans-Joachim Merrem
Patented Case
View Patent ↗
Granted: Mar 10, 1987
Filed: Jul 26, 1985
Inventors
Klaus P. Thiel
Raimund Sindlinger
Hans-Joachim Merrem
Assignee (at issue)
Merck Patent GmbH
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.