Granted Patent
Utility
US 4,650,745 · App. 06/878,736
Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development
Inventor:
James N. Eilbeck
Patented Case
View Patent ↗
Granted: Mar 17, 1987
Filed: Jun 26, 1986
Inventor
James N. Eilbeck
Assignee (at issue)
Philip A. Hunt Chemical Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.