Granted Patent
Utility
US 4,664,937 · App. 06/854,247
Method of depositing semiconductor films by free radical generation
Inventors:
Stanford R. Ovshinsky, David D. Allred, Lee Walter, Stephen J. Hudgens
Patented Case
View Patent ↗
Granted: May 12, 1987
Filed: Apr 21, 1986
Inventors
Stanford R. Ovshinsky
David D. Allred
Lee Walter
Stephen J. Hudgens
Assignee (at issue)
Energy Conversion Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.