Granted Patent
Utility
US 4,676,867 · App. 06/871,655
Planarization process for double metal MOS using spin-on glass as a sacrificial layer
Inventors:
Patricia C. Elkins, Yau Wai Howard Chan, Keh-Fei C. Chi, Karen A. Reinhardt, Rebecca Yicksin Tang, Robert L. Zwingman
Patented Case
View Patent ↗
Granted: Jun 30, 1987
Filed: Jun 6, 1986
Inventors
Patricia C. Elkins
Yau Wai Howard Chan
Keh-Fei C. Chi
Karen A. Reinhardt
Rebecca Yicksin Tang
Robert L. Zwingman
Assignee (at issue)
Rockwell International Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.