IP Library › Granted Patent US 4,678,540
Granted Patent Utility
US 4,678,540 · App. 06/872,073

Plasma etch process

Inventor: David H. Uchimura
Patented Case View Patent ↗
Granted: Jul 7, 1987 Filed: Jun 9, 1986
Inventor
David H. Uchimura
Assignee (at issue)
TEGAL CORPORATION

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Quick Facts
Patent No.
US 4,678,540
App. No.
06/872,073
Filed
1986-06-09
Granted
1987-07-07
Kind
A