IP Library Granted Patent US 4,679,942
Granted Patent Utility
US 4,679,942 · App. 06/703,941

Method of aligning a semiconductor substrate and a photomask

Inventors: Kyoichi Suwa, Hidemi Kawai, Masaichi Murakami
Patented Case View Patent ↗
Granted: Jul 14, 1987 Filed: Feb 21, 1985
Inventors
Kyoichi Suwa
Hidemi Kawai
Masaichi Murakami
Assignee (at issue)
Nippon Kogaku K.K.

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Quick Facts
Patent No.
US 4,679,942
App. No.
06/703,941
Filed
1985-02-21
Granted
1987-07-14
Kind
A