Granted Patent
Utility
US 4,699,515 · App. 06/705,699
Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween
Inventors:
Akikazu Tanimoto, Toshio Matsuura, Kyoichi Suwa
Patented Case
View Patent ↗
Granted: Oct 13, 1987
Filed: Feb 26, 1985
Inventors
Akikazu Tanimoto
Toshio Matsuura
Kyoichi Suwa
Assignee (at issue)
Nippon Kogaku K.K.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.