Granted Patent
Utility
US 4,717,679 · App. 06/935,470
Minimal mask process for fabricating a lateral insulated gate semiconductor device
Inventors:
Bantval J. Baliga, Tat-Sing P. Chow
Patented Case
View Patent ↗
Granted: Jan 5, 1988
Filed: Nov 26, 1986
Inventors
Bantval J. Baliga
Tat-Sing P. Chow
Assignee (at issue)
General Electric Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.