Granted Patent
Utility
US 4,757,208 · App. 06/837,127
Masked ion beam lithography system and method
Inventors:
Charles M. McKenna, James E. Wood, John L. Bartelt, Ross D. Olney, J. William Ward, Charles W. Slayman
Patented Case
View Patent ↗
Granted: Jul 12, 1988
Filed: Mar 7, 1986
Inventors
Charles M. McKenna
James E. Wood
John L. Bartelt
Ross D. Olney
J. William Ward
Charles W. Slayman
Assignee (at issue)
Hughes Aircraft Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.