Granted Patent
Utility
US 4,781,853 · App. 06/936,609
Method of enhancing silicon etching capability of alkali hydroxide through the addition of positive valence impurity ions
Inventors:
Robert K. Lowry, Edward U. Adams
Patented Case
View Patent ↗
Granted: Nov 1, 1988
Filed: Dec 1, 1986
Inventors
Robert K. Lowry
Edward U. Adams
Assignee (at issue)
HARRIS CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.