IP Library › Granted Patent US 4,810,613
Granted Patent Utility
US 4,810,613 · App. 07/052,950

Blocked monomer and polymers therefrom for use as photoresists

Inventors: Christopher E. Osuch, Michael J. McFarland
Patented Case View Patent ↗
Granted: Mar 7, 1989 Filed: May 22, 1987
Inventors
Christopher E. Osuch
Michael J. McFarland
Assignee (at issue)
Hoechst Celanese Corporation

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Quick Facts
Patent No.
US 4,810,613
App. No.
07/052,950
Filed
1987-05-22
Granted
1989-03-07
Kind
A