IP Library › Granted Patent US 4,821,674
Granted Patent Utility
US 4,821,674 · App. 07/032,474

Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment

Inventors: Wiebe B. deBoer, Albert E. Ozias
Patented Case View Patent ↗
Granted: Apr 18, 1989 Filed: Mar 31, 1987
Inventors
Wiebe B. deBoer
Albert E. Ozias

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Quick Facts
Patent No.
US 4,821,674
App. No.
07/032,474
Filed
1987-03-31
Granted
1989-04-18
Kind
A