Granted Patent
Utility
US 4,837,124 · App. 06/832,116
High resolution photoresist of imide containing polymers
Inventors:
Chengjiu Wu, Anne Mooring, Michael J. McFarland, Christopher E. Osuch, James T. Yardley
Patented Case
View Patent ↗
Granted: Jun 6, 1989
Filed: Feb 24, 1986
Inventors
Chengjiu Wu
Anne Mooring
Michael J. McFarland
Christopher E. Osuch
James T. Yardley
Assignee (at issue)
Hoechst Celanese Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.