Granted Patent
Utility
US 4,842,892 · App. 07/101,451
Method for depositing an n+ amorphous silicon layer onto contaminated substrate
Inventors:
Donald L. Smith, Andrew Sebastian Alimonda
Patented Case
View Patent ↗
Granted: Jun 27, 1989
Filed: Sep 29, 1987
Inventors
Donald L. Smith
Andrew Sebastian Alimonda
Assignee (at issue)
Xerox Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.