Granted Patent
Utility
US 4,844,945 · App. 07/195,236
Process for producing patterns in dielectric layers formed by plasma enhanced chemical vapor deposition (PECVD)
Inventors:
Eldurkar V. Bhaskar, Marzio Leban, Michael D. Angerstein
Patented Case
View Patent ↗
Granted: Jul 4, 1989
Filed: May 18, 1988
Inventors
Eldurkar V. Bhaskar
Marzio Leban
Michael D. Angerstein
Assignee (at issue)
Hewlett-Packard Company, L.P.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.