Granted Patent
Utility
US 4,855,792 · App. 07/193,887
Optical alignment system for use in photolithography and having reduced reflectance errors
Inventors:
David S. Holbrook, Craig R. Simpson
Patented Case
View Patent ↗
Granted: Aug 8, 1989
Filed: May 13, 1988
Inventors
David S. Holbrook
Craig R. Simpson
Assignee (at issue)
MRS Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.