Granted Patent
Utility
US 4,895,780 · App. 07/265,285
Adjustable windage method and mask for correction of proximity effect in submicron photolithography
Inventors:
Yoav Nissan-Cohen, Paul Frank, Joseph M. Pimbley, Dale M. Brown, Ernest Wayne Balch, Kenneth J. Polasko
Patented Case
View Patent ↗
Granted: Jan 23, 1990
Filed: Oct 25, 1988
Inventors
Yoav Nissan-Cohen
Paul Frank
Joseph M. Pimbley
Dale M. Brown
Ernest Wayne Balch
Kenneth J. Polasko
Assignee (at issue)
General Electric Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.