Granted Patent
Utility
US 4,902,645 · App. 07/235,403
Method of selectively forming a silicon-containing metal layer
Inventor:
Takayuki Ohba
Patented Case
View Patent ↗
Granted: Feb 20, 1990
Filed: Aug 23, 1988
Inventor
Takayuki Ohba
Assignee (at issue)
Fujitsu Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.