Granted Patent
Utility
US 4,906,552 · App. 07/158,427
Two layer dye photoresist process for sub-half micrometer resolution photolithography
Inventors:
Catherine Ngo, LeRoy H. Hackett
Patented Case
View Patent ↗
Granted: Mar 6, 1990
Filed: Feb 22, 1988
Inventors
Catherine Ngo
LeRoy H. Hackett
Assignee (at issue)
Hughes Aircraft Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.