Granted Patent
Utility
US 4,933,304 · App. 07/266,796
Method for reducing the surface reflectance of a metal layer during semiconductor processing
Inventors:
Fusen Chen, Yih-Shung Lin, Fu-Tai Liou
Patented Case
View Patent ↗
Granted: Jun 12, 1990
Filed: Nov 3, 1988
Inventors
Fusen Chen
Yih-Shung Lin
Fu-Tai Liou
Assignee (at issue)
STMICROELECTRONICS, INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.