Granted Patent
Utility
US 4,954,142 · App. 07/285,435
Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
Inventors:
Jeffrey Carr, Lawrence D. David, William L. Guthrie, Frank B. Kaufman, William J. Patrick, Kenneth P. Rodbell, Robert W. Pasco, Anton Nenadic
Patented Case
View Patent ↗
Granted: Sep 4, 1990
Filed: Mar 7, 1989
Inventors
Jeffrey Carr
Lawrence D. David
William L. Guthrie
Frank B. Kaufman
William J. Patrick
Kenneth P. Rodbell
Robert W. Pasco
Anton Nenadic
Assignee (at issue)
International Business Machines Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.