Granted Patent
Utility
US 4,956,306 · App. 07/266,756
Method for forming complementary patterns in a semiconductor material while using a single masking step
Inventors:
Robert T. Fuller, Joseph C. Tsang, William R. Richards
Patented Case
View Patent ↗
Granted: Sep 11, 1990
Filed: Nov 3, 1988
Inventors
Robert T. Fuller
Joseph C. Tsang
William R. Richards
Assignee (at issue)
HARRIS CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.