Granted Patent
Utility
US 4,994,142 · App. 07/247,839
Eliminating undercutting of mask material when etching semiconductor topography by native oxide removal
Inventor:
Ami Appelbaum
Patented Case
View Patent ↗
Granted: Feb 19, 1991
Filed: Sep 22, 1988
Inventor
Ami Appelbaum
Assignee (at issue)
Rockwell International Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.