Granted Patent
Utility
US 5,011,753 · App. 07/476,332
Photoresist compositions containing polyamides polybenzoxa from bis((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ethers
Inventors:
Werner H. Mueller, Dinesh N. Khanna
Patented Case
View Patent ↗
Granted: Apr 30, 1991
Filed: Feb 7, 1990
Inventors
Werner H. Mueller
Dinesh N. Khanna
Assignee (at issue)
Hoechst Celanese Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.