Granted Patent
Utility
US 5,013,680 · App. 07/555,980
Process for fabricating a DRAM array having feature widths that transcend the resolution limit of available photolithography
Inventors:
Tyler Lowrey, Randal W. Chance, D. Mark Durcan, Ruojia Lee, Charles H. Dennison, Yauh-Ching Liu, Pierre C. Fazan, Fernando Gonzalez, Gordon A. Haller
Patented Case
View Patent ↗
Granted: May 7, 1991
Filed: Jul 18, 1990
Inventors
Tyler Lowrey
Randal W. Chance
D. Mark Durcan
Ruojia Lee
Charles H. Dennison
Yauh-Ching Liu
Pierre C. Fazan
Fernando Gonzalez
Gordon A. Haller
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.